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There are a number of characterization characterisation techniques available in and out of the cleanroom laboratories at LNL.

This includes

measuring the thickness and quality of thin films, imaging via optical and scanning electron microscopy, metrology via atomic force microscopy and scanning probe profilometry and electrical device characterization.

:

    • scanning electron and optical microscopes for surface imaging
    • atomic force microscopy for topography, nanomechanical and electrical properties
    • scanning probe profilometry
    • X-ray diffraction for characterisation of atomic structure
    • ellipsometry for measuring film thickness and optical properties
    • and several different setups for electrical device characterisation



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