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titleTechnical information
  • Main application: Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
  • Monochromatic pulsed excimer laser (193nm wavelenth) 
  • Resolution below 100nm, Maximum pitch approx. 1.5µm.
  • 4" max wafer diameter
  • Exposure insensitive to uneven surface.


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titleTool Overview

Responsible: Sarah McKibbin

Location: Room Q241, New EBL-Lab (Level 2 - Berseilius Lab)

License and Booking Required: Yes


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titleDocumentation

User Manuals

Process

Staff Documents



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titleOther Links

Safety Information 

View on LIMS

FAQs

User Discussion Forum