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changes.mady.by.user Anders Kvennefors

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changes.mady.by.user Sarah McKibbin

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Raith 150 - Electron Beam Lithography systemImage Modified


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titleTechnical information
  • Acceleration Voltages: 5-30 kV.
  • Pattern generator speed: 10Mhz.
  • 6" Max sample size.
  • Minimum resolution: 10 nm.
  • Maximum probecurrent: 1nA
  • Equipped with thermal field emission cathode and laser interferometer stage.


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titleTool Overview

Responsible: Anders Kvennefors

Location: Room Q156, EBL-Lab (Cleanroom Level 1)

License and Booking Required: Yes


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titleDocumentation

User Manuals

Process

Staff Documents



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titleOther Links

Safety Information 

View on LIMS

FAQ




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