Versions Compared

Old Version 6

changes.mady.by.user Sarah McKibbin

Saved on

compared with

New Version 7

changes.mady.by.user Sarah McKibbin

Saved on

Key

  • This line was added.
  • This line was removed.
  • Formatting was changed.


Image Modified


Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTechnical information

Tool Summary

  • Tool Responsible: Sarah McKibbin

  • Location: Q161 UVL Lab (Level 1)

  • Maximum wafer size: 

    • Tool Information:
    • Wavelength: 240nm to 320nm.
    • Deep UV contact mask aligner, strongly damped soft UV region.
    • Exposure of small pieces and full wafers.
    • 4" max wafers.
    • Mask sizes 3.5", 4" and 5".

  • FAQ


    Panel
    borderColor#BFB8AF
    bgColorwhite
    titleColorBlack
    borderWidth2
    titleBGColor#DCE9EE
    borderStylesolid
    titleTool Overview

    Responsible: Sarah McKibbin

    Location: Room Q161, UVL - Lab (Level 1)

    License and Booking Required: Yes

      
    Panel
    borderColor#BFB8AF
    bgColorwhite
    titleColorBlack
    borderWidth2
    titleBGColor#DCE9EE
    borderStylesolid
    titleDocumentation
    Safety

    User Manuals

    Process

    Staff Documents



    Panel
    borderColor#BFB8AF
    bgColorwhite
    titleColorBlack
    borderWidth2
    titleBGColor#DCE9EE
    borderStylesolid
    titleOther Links

    Safety Information 

       

    View on LIMS

        

    FAQ