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titleTechnical information
  • Main application: Low power descum and resist etching.

Tool Summary

  • Tool Responsible: Sarah McKibbin

  • Location: Q156 - EBL lab (Level 1)

  • License Required: Yes

  • Booking Compulsory: Yes 

    • Tool Information:
    • Parallel plate RF etcher. 
    • Max Power: 30 W.
    • Min Power: 1 W.
    • Low power descum and residuals removal.
    • 3" max wafer diameter

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    titleTool Overview

    Responsible: Sarah McKibbin and Alex den Ouden

    Location: Room Q156, EBL-Lab (Cleanroom Level 1)

    License and Booking Required: Yes


    Safety

    User Manuals

    Process

    Staff Documents


         View on LIMS

        


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    titleDocumentation

    User Manuals

    Process

    Staff Documents



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    titleOther Links

    Safety Information 

    View on LIMS

    FAQ