Tool Summary

• Tool Responsible: Sarah Mckibbin

• Location: Q241

  (Level 2)

• Tool Information:

  • Monochromatic pulsed excimer laser - class 4
  • 193nm exposure 
  • Resolution below 100nm, estimated maximum pitch approx. 1.5µm.
  • 4" max wafer diameter
  • Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
  • Exposure insensitive to uneven surface.
  Maximum wafer size: 4"

• FAQ

Safety

User Manuals

Process

Staff Documents

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